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Bulletin of Botanical Research ›› 2000, Vol. 20 ›› Issue (4): 427-432.

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THE CROWTH EFFECT BY N+ USING A PLASMA IMERSION ION IMPLANTER OF PEA SEED IMPLANTED

DU Lan-Fang1, YU Da1, LU Xiang-Yun1, WU Mei-Ping2, PAN Chong-Guang3   

  1. 1. Dept. of Biology, Changshu College, Changshu 215500;
    2. Dept. of Basic Science, China Textile Univ., Shanghai 200051;
    3. Dept. of Plant Science of Shanghai Agricultural College, Shanghai 201101
  • Received:1999-06-10 Online:2000-12-15 Published:2016-06-14

Abstract: The genetic effect on plant growth by plasma immersion ion implanter after implantation on pea seed was studied. The results showed the seed treated was not only the germination percentage decline but also the plant growth retardation, and the stem of a plant was low. The semilethal dosage was 20 minutes. Being an economical and available method plasma immersion ion implantation in mutagenic breeding was proposed.

Key words: Plasma immersion ion implantation, Pea, Growth